Diffuser master and method of manufacture

ABSTRACT

A diffuser master is provided which is manufactured mechanically instead of holographically. The master can be made from a suitable substrate including relatively hard materials such as plastic, glass or metal. A substrate having a first side is worked to form a diffuser surface relief structure thereon. The substrate can be buffed using a buffing agent of a selected grit in order to form surface scratches in the first side of the substrate. The substrate can also be blasted with shot particles in order to form indentations and depressions in the first side. The substrate can alternatively be acid or alkali etched in order to form surface irregularities in the first side. The scratches, depressions or irregularities can be formed in order to create a desired surface relief and hence desired diffuser output characteristics.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates generally to optical elements, and moreparticularly to a non-Lambertian diffuser fabricated using mechanicalmeans instead of light and mechanical methods for fabricating thediffuser.

2. Description of the Related Art

Methods for manufacturing and replicating optical components such as amaster diffuser exhibiting desired light diffusing characteristics arewell known. Many of these methods involve creating a master diffuser byexposing a photoresist material to a source of light and thenreplicating this master diffuser into one or more submasters of a moredurable nature. Many of these methods inherently destroy the masterdiffuser when creating the submasters. There are also other methods ofmaking replicas of a master diffuser which contain the optical featuresin the master without destroying the master diffuser. With each of thesemethods, the master diffuser is initially created optically. Submastersare created from these master diffusers utilizing a number of methodswhereby the master diffuser surface is replicated into a submastersurface. These other methods are described in one or more pending U.S.applications, referenced below, which are assigned to the assignee ofthe present invention.

One such method involves creating a submaster for an optical product byrecording optical features on a photosensitive medium using coherent orincoherent light. The photosensitive medium is then further processed tocreate a master optical product. A layer of two part silicone epoxy isthen poured over the master to replicate the optical surface features ofthe master photosensitive medium in the silicone epoxy material. Thesilicone epoxy layer cures at room temperature and becomes rubber. Thesilicone material is then further cured and separated from the master toobtain a silicone rubber submaster. The soft silicone submaster is thenused to make successive generations of submasters or final opticalproducts by covering the soft submaster with a layer of epoxy, coveringthe layer of epoxy with a plastic substrate, curing the epoxy andseparating the epoxy and plastic substrate from the submaster. Thisparticular method of creating a diffuser is highly labor intensive,requires use of many different materials, requires performing a numberof steps, and must be conducted in a sterile environment.

The specific embodiments described above regarding the rubber submasterand the silver and nickel submaster are disclosed in co-pending U.S.application Ser. No. 09/052,586 entitled “Method of Making ReplicasWhile Preserving Master,” commonly assigned to the assignee of thepresent invention.

Another method of creating a diffuser involves recording opticalfeatures in a photosensitive medium using coherent or incoherent lightand then processing the medium to create a master. The photosensitivemedium is then coated with a layer of silver. A layer of nickel iselectroplated onto the silver layer and then the silver layer and layerof nickel are removed from the photosensitive material or medium to formthe submaster. The combined silver and nickel backing form a metal shimsubmaster which is then replicated to fabricate final optical productsby embossing the surface features of the submaster into epoxies,plastics or polycarbonate materials, or by injection molding suchmaterials into a mold carrying the submaster. Again, this process iscostly, labor intensive, wasteful of material and requires a sterileenvironment.

Another significant problem with each of these methods is that thesubmasters or final optical products created from the master opticalelements are made from materials such as plastics, epoxies, orpolycarbonate composites and exhibit relatively poor long-termcharacteristics. These materials are also not suited for use nearextremely high temperature light sources because they have relativelylow melting or softening temperatures when compared to other moredurable materials.

Other commonly assigned U.S. patents and pending applications disclosesomewhat related methods for making and recording optical products andreplicating those products so that they may be mass produced. Forexample, U.S. Pat. No. 5,365,354 entitled “Grin Type Diffuser Based onVolume Holographic Material,” U.S. Pat. No. 5,534,386 entitled“Homogenizer Formed Using Coherent Light and a Holographic Diffuser,”and U.S. Pat. No. 5,609,939 entitled “Viewing Screen Formed UsingCoherent Light,” all owned by the present assignee relate to methods forrecording and replicating optical products. Each of these U.S. patentsis incorporated herein by reference for purposes including, but notlimited to, indicating the background of the present invention andillustrating the state of the art.

Related U.S. patent application include Ser. No. 08/595,307 entitled“LCD With Light Source Destructuring and Shaping Device,” Ser. No.08/601,133 entitled “Liquid Crystal Display System with CollimatedBacklighting and Non-Lambertian Diffusing,” Ser. No. 08/618,539 entitled“Method of Making Liquid Crystal Display System,” Ser. No. 08/800,872entitled “Method of Making Replicas and Compositions for Use Therewith,”and Ser. No. 09/075,023 entitled “Method and Apparatus for MakingOptical Masters Using Incoherent Light.” All the above applications areowned by the present assignee and are hereby incorporated by referencefor purposes including, but not limited to, indicating the background ofthe present invention and illustrating the state of the art.Additionally, each of these patents and applications disclose methods ofmaking optical products wherein the methods or the products exhibit manyor all of the above-noted disadvantages.

SUMMARY OF THE INVENTION

A primary object of the present invention is to provide a method formaking a diffuser optical product utilizing conventional mechanicalmeans instead of the aforementioned holographic and complex and costlymethods. Another primary object of the present invention is to provide adiffuser from an extremely durable material such as glass or metal. Itis another object of the present invention to provide a diffuser whichis suitable for use under extreme temperature conditions such asadjacent a high temperature active light source in a liquid crystaldisplay or the like. It is a further object of the present invention toprovide a method for producing such a diffuser which requires fewersteps for creating the diffuser and is less costly in materials, cost oflabor and cost of the manufacturing environment.

In accordance with the present invention, these objects are achieved byseveral methods for producing a diffuser from highly durable materialssuch as glass or metal and by the resulting diffuser optical productsthemselves.

In one embodiment, a method for producing such a diffuser first includesproviding a substrate body having at least a first side. A workingmaterial is then selected which has desired qualities for altering thecharacteristics of the first side of the substrate body. The workingmaterial is applied to the first side in order to form a plurality ofirregularities thereon which define a diffuser surface. The diffusersurface exhibits light propagating characteristics defined by theparticular characteristics of the plurality of irregularities.

In one embodiment, the working material is a buffing agent having adesired grit. The first side of the substrate body is buffed utilizingthe buffing agent which forms a plurality of scratches in the first sideaccording to the particular grit of the agent. The scratches define thediffuser surface and thereby exhibit light propagating characteristicsdefined by the orientation, contour, length and depth of the pluralityof irregularities.

In another embodiment, the working material is an acid or alkali agentselected to react with a particular substrate body material. The acid oralkali agent is placed on the first side of the substrate body for anetching time duration. The acid or alkali agent etches a plurality ofirregularities into the first side of the substrate body. The pluralityof irregularities each have at least a size, a depth, and a contourformed according to the reaction between the substrate body and the acidor alkali agent as well as etching time duration. The diffuser surfaceon the first side exhibits light propagation characteristics defined bythe size, depth and contour of the irregularities formed by the etchingor acid or alkali agent.

In another embodiment, the acid or alkali etching agent also includes aplurality of particles mixed therein each having a size, a shape and amass. The particles enhance the etching reaction between the substratebody and the acid or alkali agent by forming deeper depressions wherethe particles are located on the first side of the substrate body. Inanother embodiment, a pressure may be applied to the first side of thesubstrate body while the acid or alkali agent and particles are disposedthereon to further enhance penetration of the particles into the firstside of the substrate body as the acid or alkali agent reacts with thesubstrate body material.

In one embodiment, a mask having a plurality of openings formed thereinis applied to the first side of the substrate body. The acid or alkaliagent is placed on the first side over the mask and thereby etches aplurality of irregularities into the first side where the first side isexposed through the openings of the mask. The irregularities each have asize, depth and contour which are essentially determined by the length,width, orientation and shape of the plurality of openings in the mask aswell as the particular reaction between the acid agent and the substratebody as well as the etching time duration.

In one embodiment, the working material is a blasting agent whichincludes a plurality of shot particles each having a size, a shape and amass. The blasting agent is forced against the first side of thesubstrate body such as in a sandblasting operation at a predeterminedvelocity to form a plurality of irregularities or depressions. Thedepressions are formed according to the size, shape and mass of the shotparticles as well as the predetermined velocity. The diffuser surfacestructure is defined by the depth, contour and size of the plurality ofirregularities formed in the first side of the substrate body.

In another embodiment of the invention, a diffuser is disclosed having asubstrate body and at least a first side. A diffuser surface reliefstructure formed non-holographically in the first side defines aplurality of irregularities therein. The irregularities have lightpropagating characteristics which are defined by at least one of thesize, depth, length, width, orientation, and contour of the plurality ofirregularities.

In one embodiment, the substrate body is formed from a glass materialsubstrate. In another embodiment, the substrate body is formed from ahard plastic material substrate. In another embodiment, the substratebody is formed from a metallic material substrate.

In one embodiment, the surface relief structure is comprised of aplurality of scratches formed by buffing the first side with a buffingagent having a predetermined grit. In another embodiment, the surfacerelief structure is comprised of a plurality of closely spaceddepressions in the first side formed by forcing a plurality of shotparticles at a predetermined velocity against the first side. In afurther embodiment, the surface relief structure is acid etched into thefirst side by an acid agent placed on the first side of the substratebody.

These and other aspects and objects of the present invention will bebetter appreciated and understood when considered in conjunction withthe following description and accompanying drawings. It should beunderstood, however, that the following description, while indicatingpreferred embodiments of the present invention, is given by way ofillustration and not of limitation. Many changes and modifications maybe made within the scope of the present invention without departing fromthe spirit thereof and the invention includes all such modifications.

DESCRIPTION OF THE DRAWINGS

A clear conception of the advantages and features of the presentinvention, and of the construction and operation of typical mechanismsprovided with the present invention, will become more readily apparentby referring to exemplary and therefore non-limiting embodimentsillustrated in the drawings accompanying and forming a part of thisspecification, and in which:

FIG. 1A illustrates an elevational perspective view of a glass diffuserconstructed in accordance with one embodiment of the present invention;

FIG. 1B illustrates an elevational perspective view of a metal diffuserconstructed in accordance with another embodiment of the presentinvention;

FIG. 1C illustrates an elevational perspective view of a plasticdiffuser constructed in accordance with another embodiment of thepresent invention;

FIG. 2 illustrates a schematic view of a buffing process for forming oneof the diffusers of FIGS. 1A-1C;

FIG. 3 illustrates a schematic view of an etching process for formingone of the diffusers illustrated in FIGS. 1A-1C;

FIG. 4 illustrates an alternative etching process for forming one of thediffusers illustrated in FIGS. 1A-1C;

FIG. 5A illustrates another alternative etching process for forming oneof the diffusers illustrated in FIGS. 1A-1C;

FIG. 5B illustrates a perspective view of the diffuser illustrated inFIG. 5A;

FIG. 6 illustrates a schematic view of a blasting process for formingone of the diffusers illustrated in FIGS. 1A-1C;

FIG. 7A illustrates an elevational plan view of the diffuser surface ofa diffuser; and

FIG. 7B illustrates a cross-sectional view of the diffuser surface takenalong lines 7B—7B of FIG. 7A.

DETAILED DESCRIPTION OF THE PRESENTLY PREFERRED EMBODIMENTS

Referring now to the drawings, FIGS. 1A-1C illustrate several simplifiedelevational perspective views of diffusers formed by one of the methodsof the present invention. The present invention may be utilized to formdiffusers from substrate materials such as plastics, glass or metal. Themethods are appropriate for forming diffusers from conventional diffusermaterials such as epoxy, polycarbonate, polyester, acrylic, nylon,polystyrene, tetrafluoroethylene, polyimide, polyvinyl chloride,polymethyl methacrylate, TPX™, ARTON™, and other plastic materials butalso may be utilized to form diffusers from much more durable materialssuch as glass and metal for which previous methods were not suitable.Glass materials that can be used include light barium crown, phosphatecrown, crown, flint, extralight flint, light flint, fused silicon, andborosilicate. FIG. 1A illustrates a glass diffuser 20 constructedaccording to one embodiment of the present invention. FIG. 1Billustrates a metal diffuser 22 constructed in accordance with oneembodiment of the present invention. FIG. 1C illustrates a plasticdiffuser 24 constructed in accordance with one embodiment of the presentinvention. The glass diffuser 20, metal diffuser 22, and plasticdiffuser 24 will be described in greater detail below with reference tothe processes of the invention.

FIG. 2 illustrates a schematic view of a process of forming a randomsurface relief structure on a diffuser substrate body. The substratebody 30 includes a first side 32 onto which a diffuser surface reliefstructure will be formed. The substrate 30 is illustrated in the form ofa flat rectangular plate and the diffusers 20, 22 and 24 are illustratedin the form of rectangles in FIGS. 1A-1C. It is intended that thediffusers and the substrate material may take on any number ofconfigurations and constructions without departing from the scope of thepresent invention. The simple shapes and configurations illustratedherein are shown for simplification of description and not by way oflimitation.

The substrate 30 of the present embodiment can also be in the form of aglass substrate, a metal substrate, or a plastic substrate withoutdeparting from the scope of the present invention. Depending upon thetype of substrate material selected, the process shown in FIG. 2 mayvary slightly in order to produce the desired surface relief structureas described below. The method of the invention is capable of forming asurface relief structure on a common material such as plastic but isalso capable of forming such a surface relief structure on hard andhighly durable materials such as glass and metal. Prior methods offorming diffuser surface relief structures are not capable of producingsuitable surface relief structures on such hard and durable materials.

Referring again to FIG. 2, the first side 32 of the substrate 30 isfacing upward although this orientation can be altered without departingfrom the scope of the invention. The substrate 30 can also be held in asuitable fixture (not shown) or other apparatus for affixing thesubstrate in place while it is being worked.

As illustrated in FIG. 2, a suitable buffing agent 34 is disposed on thefirst side 32 of the substrate 30. Buffing agents that can be usedinclude agents such as aluminum oxide, silicon carbide, and ceriumoxide. A buffing apparatus 36 is disposed over the substrate 30 and isutilized to work the buffing agent 34 against the first side 32 toproduce scratches or other such irregularities in the substrate firstside 32. Depending upon the materials selected for the substrate 30, thebuffing agent is selected including a particular grit in the form ofbuffing particles 35 which are suspended within a compound or which areotherwise attached to the buffing apparatus 36. The buffing particles 35are determined by the type of substrate material 30 selected.

For example, if the substrate 30 is a plastic material, the buffingagent 34 may be a buffing compound having suspended therein a pluralityof buffing particles 35 in the form of sand or silica of a particulargrit or size. Alternatively, the buffing agent can be in the form ofwhat is commonly known as sandpaper which includes a paper substratehaving sand or silica particles adhered thereto of a particular grit. Ineither case, the buffing particles must be suitable for working andabrading the surface of the relatively soft plastic substrate.

FIG. 2 illustrates that a buffing agent 34 including suspended silicaparticles is disposed on the first side 32 of the substrate 30. Thebuffing apparatus 36 includes a buffing pad 38 that is brought intocontact with the buffing compound 34 and rotated or otherwise movedagainst the buffing compound 34. The buffing pad 38 works the buffingagent 34 including the suspended silica particles into the first side 32to form a plurality of surface irregularities in the form of scratchesand indentations in the surface. In an alternative embodiment, thebuffing apparatus 36 may have a sheet or pad of sandpaper mounted to thepad 38, where the sheet includes the silica particles adhered thereto.In this embodiment, the buffing compound 34 is not necessary and isreplaced by the sandpaper carried on the buffing pad 38.

FIG. 2 illustrates that the buffing pad 38 is rotated about a rotaryshaft 40 in order to work the buffing agent 34 into the first side 32.The buffing pad 38 can alternatively be a surface which moves back andforth across the first side 32 in order to produce the scratches andindentations. In a further alternative, the buffing pad 38 can beconnected via a mechanism (not shown) and electronic means to a computersystem 42 for guiding the buffing pad 38 over the first side 32. In suchan embodiment, the particular surface scratches and indentations arepreprogrammed into the computer and replicated onto the first side 32 asdesired.

In this embodiment, the surface irregularities, indentations orscratches are formed in the first side 32 of the substrate 30 by thesilica or buffing particles of the buffing agent 34 physically cuttinginto the first side 32. The depth, cross-sectional contour, length andshape of the scratches depends on the direction of rotation and/orlinear movement of the buffing pad 38 of the buffing apparatus 36relative to the first side of the substrate.

If the substrate body 30 is alternatively formed from a material such asglass or a very hard plastic or a soft metal such as gold, the buffingagent 34 may include a more durable type of sand or silica particle 35is suitable for forming scratches and indentations and otherwisedeforming such hard materials. Alternatively, if the substrate materialis any type of glass including extremely hard composite glass, thebuffing agent 34 may include buffing particles 35 in the form of adiamond powder or diamond particles suitable for scratching or otherwisedeforming such a hard surface. The type of buffing agent 34 as well asthe particular construction of the buffing apparatus 36 is selected anddesigned according to the desired diffuser characteristics and thesubstrate 30 material.

Referring now to FIG. 3, a substrate body 50 includes a first side ontowhich a surface relief structure is to be formed. Again, the substratematerial can be any suitable material but preferably is a metal or glasssubstrate material. Additionally, the substrate 50 can be supported in asuitable fixture or machine (not shown) in order to perform the processof the invention.

An acid or alkali etching agent 54, such as hydrochloric acid,hydrofluoric acid, ammonium fluoride, potassium hydroxide or sodiumhydroxide is poured on or otherwise disposed over the first side 52 ofthe substrate 50. The etching agent 54 reacts with the substratematerial and forms irregularities or depressions in the first side 52 todefine the diffuser surface relief structure as is described in moredetail below. The etching acid or alkali can be any type of acid oralkali that is selected to react as desired with a particular substratematerial from which the substrate body 50 is manufactured. The etchingacid in one preferred embodiment is a solution containing eitherhydrofluoric acid or ammonium fluoride. The etching alkali in onepreferred embodiment is a solution containing either potassium hydroxideor sodium hydroxide. Depending on the amount of time the acid or alkaliis left on the first side of the substrate and on the concentration ofthe acid or alkali, the etching agent 54 reacts with the first side toform the irregularities thereon. The etching acid or alkali essentiallyeats away at the surface of the substrate body 50 where it is locatedand where it is most concentrated. For example, the etching acid oralkali can be applied to the first side 52 for less than 2 minutes on aglass or metal substrate body 50 to produce the desired result.

After the desired duration of acid or alkali etching has expired, thefirst side 52 is washed with water or another cleaning solution in orderto remove all of the remaining etching agent 54. A suitable hose 58connected to a reservoir of water other solution 60 can be retained nearthe substrate 50 in order to wash the etching agent 54 from thesubstrate.

In the present embodiment, a plurality of solid particles 56 aresuspended in the acid or alkali etching agent 54 to further enhance theetching process and to produce a more desirable surface relief structurein the first side 52 of the substrate. Alternatively, the particles canbe first placed on top of the substrate body 50, such as a glasssubstrate, and then the etching agent 54 poured over the first side 52and the particles 56 to produce the desired surface relief. Theparticles 56 enhance the surface relief structure by penetrating deeperinto the first side 52 according to the mass and size of each particleand according to the chemical reaction between the etching agent 54 andthe substrate body 50 beneath each particle. The greater the mass ofeach particle 56, the deeper the depression left beneath each particularparticle.

FIG. 4 illustrates another alternative embodiment of the acid or alkalietching process whereby a pressure plate or pressing tool 62 is placedover the first side 52 sandwiching therebetween the acid or alkalietching agent 54 and the particles 56. A force in the direction ofarrows F is applied to the pressure plate or pressing tool 62 toincrease penetration of the particles deeper into the first side 52. Themore force applied to the plate 62, the deeper the particles 56 willembed into the first side 52 thereby enhancing the surface reliefstructure.

The size, shape and mass of the particular particles 56 can varyconsiderably depending on the desired surface relief characteristicsformed in the first side 52. In one embodiment, a powder such as aceramic powder including very fine particles can be utilized and placedon the first side 52 of the substrate body 50. The ceramic powderparticles are particularly useful for etching a substrate of glass.Particular examples of suitable powder particles include silicon carbideand boron carbide. Such powder particles can either be in the form ofirregular and randomly shaped particles in a range of sizes from about 4mm to about 0.045 mm. Alternatively, particles can have a general shapeof hexagonal, rhombohedral, spherical, or any other suitable shape andrange in sizes from about 4 mm to about 0.045 mm. The larger theparticle size, the deeper the impression made in the first side 52.Spherical particles 56 will leave essentially semi-circular or sphericaldepressions in the first side 52.

FIGS. 5A and 5B illustrate another alternative embodiment which can beutilized to etch a surface relief structure in a substrate body 50. FIG.5B illustrates a perspective view of substrate body 50 and the mask 64.In this embodiment, a mask 64 made of a material such as polyester orpolycarbonate is placed over the first side 52 of the substrate body 50.A portion of the first side 52 is exposed through a plurality ofopenings 66 formed in the mask 64. The openings 66 can be randomlyproduced in the mask or can be computer generated in order to produce aparticular and predetermined surface relief structure in the substratebody 50.

In this embodiment, the etching agent 54 does not necessarily includeparticles 56 therein but may instead be a purely liquid solution. Theetching acid solution 54 is then poured over the mask 66 and etches thefirst side 52 of the substrate body 50 only where exposed through theopenings 66. The surface contour and configuration of the surface reliefstructure formed on the first side 52 is determined by the length,width, contour, spacing and shape of the openings 66 provided in themask 64 as well as the acid concentration, duration and etching and acidand substrate compositions. Virtually any pattern of openings can beproduced in the mask 64 to form any number of surface relief structuresin the substrate body 50.

Referring now to FIG. 6, another alternative embodiment for producing asurface relief structure in a substrate body is disclosed. In thisembodiment, a substrate body 70 is provided having a first side 72 ontowhich a diffuser surface relief structure is to be formed. The substratebody 70 is placed adjacent a blasting apparatus 74 having a nozzle 76from which a blasting material is ejected at a high velocity in thedirection of the arrows B toward the first side 72 of the substrate. Ahose 78 is connected to a supply (not shown) of blasting material orparticles 80 drawn into the hose 78 of the apparatus 74 and ejectedtoward the substrate. The particles 80 can be in the form of shotparticles and may be provided from any number of materials such asspherical metal balls or sand or silica particles of various sizes andshapes. The particles 80 are ejected from the blasting apparatus 74 andbombard the first side 72 of the substrate. Upon impact with thesubstrate, the particles 80 form small depressions or pits in the firstside. These depressions or pits define the surface relief structure ofthe diffuser created on the substrate 70. The shape, size and contour ofthe depressions or pits are defined by the mass, size and shape of theshot particles 80, the velocity of the particles exiting the nozzle 76,and the material which forms the particles and the substrate body 70.Additionally, the angle of incidence of the nozzle 76 relative to thefirst side 72 and the path of travel of the shot particles 80 relativeto the first side 72 also affects the structure formed on the firstside. Additionally, the size and shape of the nozzle 76 may also bevaried in order to change the surface relief structure characteristicsformed on the first side of the substrate.

Referring now to FIG. 7A, an elevation plan view of a diffuser and adiffuser surface formed by any of the above embodiments is illustrated.The diffuser has a substrate 30, 50, or 70 and a diffuser surface 33,53, or 73 formed by the buffing, etching, and blasting embodiments,respectively. FIG. 7B illustrates a cross-sectional view of the diffusersurface taken along lines 7B—7B of FIG. 7A.

The shape and orientation of the scratches and indentations determinethe light output characteristics of the diffuser, includingnon-Lambertian output. For example if the scratches are long and narrowin one direction the light output from the diffuser will be adistribution which is long and narrow in the perpendicular direction.If, for example, a circular light distribution is desired, scratches orindentations of a more circular shape, such as might be achieved bypressing the buffing material into the surface in the presence of acid,are preferably used.

Though the invention was described referring to particular embodiments,many other changes and modifications may be made to the invention asdescribed without departing from the spirit and scope thereof. The scopeand spirit of these changes and modifications will become apparent fromthe appended claims. The scope of the invention is therefore intendedonly to be limited by the appended claims.

What is claimed is:
 1. A method of making a non-Lambertian diffuser, themethod comprising the steps of: providing a substrate body having atleast a first side; selecting an etching agent; mixing a plurality ofsolid particles with the acid agent to form a working compound, each ofthe plurality of particles having a size, a shape and a mass; placingthe etching agent on the first side of the substrate body for an etchingtime duration; and etching a plurality of irregularities into the firstside, the plurality of irregularities having at least a size, a depthand a contour formed according to a reaction between the substrate bodyand the etching agent and according to the etching time duration tothereby form a diffuser surface on the first side having lightpropagation characteristics defined by the size, depth and contour ofthe irregularities.
 2. The method according to claim 1, wherein the stepof providing further includes providing a substrate body formed from aglass material.
 3. The method according to claim 1, wherein the step ofproviding further includes providing a substrate body formed from aglass material selected from at least one of the group consisting oflight barium crown, phosphate crown, crown, flint, extralight flint,light flint, fused silica, and borosilicate.
 4. The method according toclaim 1, wherein the step of selecting further includes selecting anetching agent from at least one of the group consisting of sodiumhydroxide, potassium hydroxide, hydrofluoric acid, and ammoniumfluoride.
 5. The method according to claim 1, further comprising thestep of: applying pressure against the first side after the step ofplacing the working compound thereon in order to increase the depth ofthe plurality of irregularities.
 6. The method according to claim 1,wherein the step of mixing further includes providing a plurality ofparticles each having a general shape selected from the group consistingof hexagonal, rhombohedral, and spherical, and a diameter within a rangeof diameters from about 4 mm to about 0.045 mm.
 7. The method accordingto claim 5, wherein the plurality of particles are provided having anumber of different diameters, the diameter of each of the plurality ofparticles being within a range of diameters.
 8. The method according toclaim 1, wherein the step of mixing further includes providing theplurality of particles selected form at least one of the groupconsisting of silicon carbide and boron carbide.
 9. The method accordingto claim 1, further comprising the steps of: selecting a mask having aplurality of openings passing through the mask, each of the plurality ofopenings having a length, a width, an orientation and a shape; securingthe mask flush against the first side of the substrate body forming atleast one masked portion and at least one unmasked portion of thesubstrate body; placing the working compound over the mask on the firstside; and etching the plurality of irregularities into the unmaskedportion of the first side of the substrate body whereby the size, depthand contour of the plurality of irregularities are determined by thelength, width, orientation and shape of the plurality of openings in themask as well as the reaction between the etching agent and the substratebody and the etching time duration.
 10. The method according to claim 9,wherein the step of selecting a mask further includes selecting a maskmade from a material selected from the group consisting of polyester andpolycarbonate.
 11. A method of making a non-Lambertian diffuser, themethod comprising the steps of: providing a substrate body having atleast a first side; selecting a mask having a plurality of openingspassing through the mask, each of the plurality of openings having alength, a width, an orientation and a shape; securing the mask flushagainst the first side of the substrate body forming at least one maskedportion and at least one unmasked portion of the substrate body;selecting an etching agent; mixing a plurality of solid particles withthe etching agent to form a working compound, each of the plurality ofparticles having a size, a shape and a mass; placing the etching agentover the mask on the first side; and etching the plurality ofirregularities into the unmasked portion of the first side of thesubstrate body wherein the size, depth and contour of the plurality ofirregularities are determined by the length, width, orientation andshape of the plurality of openings in the mask as well as the reactionbetween the etching agent and the substrate body and the etching timeduration.
 12. The method according to claim 11, wherein the step ofselecting a mask further includes selecting a mask made from a materialselected from the group consisting of polyester and polycarbonate.